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Metrologic Accused Of Patent Infringement


Blackwood, New Jersey – Metrologic Instruments, Inc. (NASDAQ-NMS:MTLG), today announced that on May 10, 2006, PSC Scanning, Inc., a subsidiary of PSC Inc., filed a Complaint against Metrologic Instruments, Inc. in the United States District Court in Oregon. The essence of the claim is that Metrologic’s Stratos product line of bi-optic scanners infringes two PSC patents. The suit seeks equitable relief and damages. Metrologic strongly disputes these claims and intends to vigorously defend this action and its intellectual property.

As reported in our first quarter earnings press release on May 9, 2006, Metrologic continues to show dramatic revenue growth and is gaining market share as verified by independent research organizations, outpacing the industry at large. Our consistent ability to grow sales extends to many product lines across the globe, allowing us to make inroads into markets previously dominated by only one or two manufacturers.

Metrologic’s Stratos product fa

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Did You Know?

There is a time limit on patent protection.

For applications filed on or after June 8, 1995, utility and plant patents are granted for a term which begins with the date of the grant and usually ends 20 years from the date you first applied for the patent subject to the payment of appropriate maintenance fees. Design patents last 14 years from the date you are granted the patent. Note: Patents in force on June 8 and patents issued thereafter on applications filed prior to June 8, 1995 automatically have a term that is the greater of the twenty year term discussed above or seventeen years from the patent grant.

Contact our Patent Professionals to ensure you complete the patent filing process correctly or for violation of your patent rights.

 

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EFS-ABX

Definition:
Electronic Filing System – Application Body eXtensible Markup Language authoring tool.

Claims

Definition:
The specification must conclude with a claim particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention or discovery.

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